JPH0415619B2 - - Google Patents

Info

Publication number
JPH0415619B2
JPH0415619B2 JP52029208A JP2920877A JPH0415619B2 JP H0415619 B2 JPH0415619 B2 JP H0415619B2 JP 52029208 A JP52029208 A JP 52029208A JP 2920877 A JP2920877 A JP 2920877A JP H0415619 B2 JPH0415619 B2 JP H0415619B2
Authority
JP
Japan
Prior art keywords
insulating film
forming
etching
contact hole
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP52029208A
Other languages
English (en)
Japanese (ja)
Other versions
JPS53115173A (en
Inventor
Mitsumasa Koyanagi
Yoshio Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2920877A priority Critical patent/JPS53115173A/ja
Publication of JPS53115173A publication Critical patent/JPS53115173A/ja
Publication of JPH0415619B2 publication Critical patent/JPH0415619B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP2920877A 1977-03-18 1977-03-18 Production of semiconductor device Granted JPS53115173A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2920877A JPS53115173A (en) 1977-03-18 1977-03-18 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2920877A JPS53115173A (en) 1977-03-18 1977-03-18 Production of semiconductor device

Publications (2)

Publication Number Publication Date
JPS53115173A JPS53115173A (en) 1978-10-07
JPH0415619B2 true JPH0415619B2 (en]) 1992-03-18

Family

ID=12269769

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2920877A Granted JPS53115173A (en) 1977-03-18 1977-03-18 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS53115173A (en])

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57167653A (en) * 1981-03-23 1982-10-15 Fujitsu Ltd Manufacture of semiconductor device
JPS5955054A (ja) * 1982-09-24 1984-03-29 Hitachi Ltd 半導体装置の製造方法
JPS59184523A (ja) * 1983-04-05 1984-10-19 Yokogawa Hokushin Electric Corp バイポーラトランジスタの製造方法
JPS6012754A (ja) * 1983-07-01 1985-01-23 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JP2509173B2 (ja) * 1985-02-08 1996-06-19 株式会社日立製作所 相補型ｍｉｓｆｅｔを有する半導体集積回路装置の製造方法
JPS62104170A (ja) * 1985-10-31 1987-05-14 Matsushita Electronics Corp Ｍｏｓ型半導体装置
JP2859332B2 (ja) * 1989-12-13 1999-02-17 株式会社東芝 半導体装置の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3912558A (en) * 1974-05-03 1975-10-14 Fairchild Camera Instr Co Method of MOS circuit fabrication
JPS5191676A (en]) * 1975-02-10 1976-08-11
JPS51147272A (en) * 1975-06-13 1976-12-17 Hitachi Ltd Manufacturing process of mis-type field effect transistor
JPS5233490A (en) * 1975-09-09 1977-03-14 Nec Corp Manufacturing process of semiconductor device
JPH0849382A (ja) * 1994-08-05 1996-02-20 Misawa Homes Co Ltd 階段の手摺構造

Also Published As

Publication number Publication date
JPS53115173A (en) 1978-10-07

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